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Patents/USD1066275

Baffle for Anti-rotation Process Kit for Substrate Processing Chamber

USD1066275No. D 1,066,275designGranted 3/11/2025

Claims (1)

Claim 1 (Independent)

The ornamental design for a baffle for anti-rotation process kit for substrate processing chamber, as shown and described.

Full Description

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FIG. 1 is a top, front, right side isometric view of a first embodiment of a baffle for anti-rotation process kit for substrate processing chamber showing our new design.

FIG. 2 is a bottom, left side, back isometric view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a front elevation view thereof.

FIG. 6 is a back elevation view thereof.

FIG. 7 is a left side elevation view thereof.

FIG. 8 is a right side elevation view thereof.

FIG. 9 is a cross-sectional view taken along line 9 - 9 in FIG. 3 .

FIG. 10 is a top, front, right side isometric view of a second embodiment of a baffle for anti-rotation process kit for substrate processing chamber showing our new design.

FIG. 11 is a bottom, left side, back isometric view thereof.

FIG. 12 is a top plan view thereof.

FIG. 13 is a bottom plan view thereof.

FIG. 14 is a front elevation view thereof.

FIG. 15 is a back elevation view thereof.

FIG. 16 is a left side elevation view thereof.

FIG. 17 is a right side elevation view thereof; and,

FIG. 18 is an enlarged cross sectional view taken along line 18 - 18 in FIG. 12 .

The dashed lines in FIGS. 1 - 13 represent unclaimed environment and form no part of the claimed design.

Citations

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