Baffle for Anti-rotation Process Kit for Substrate Processing Chamber
Claims (1)
The ornamental design for a baffle for anti-rotation process kit for substrate processing chamber, as shown and described.
Full Description
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FIG. 1 is a top, front, right side isometric view of a first embodiment of a baffle for anti-rotation process kit for substrate processing chamber showing our new design.
FIG. 2 is a bottom, left side, back isometric view thereof.
FIG. 3 is a top plan view thereof.
FIG. 4 is a bottom plan view thereof.
FIG. 5 is a front elevation view thereof.
FIG. 6 is a back elevation view thereof.
FIG. 7 is a left side elevation view thereof.
FIG. 8 is a right side elevation view thereof.
FIG. 9 is a cross-sectional view taken along line 9 - 9 in FIG. 3 .
FIG. 10 is a top, front, right side isometric view of a second embodiment of a baffle for anti-rotation process kit for substrate processing chamber showing our new design.
FIG. 11 is a bottom, left side, back isometric view thereof.
FIG. 12 is a top plan view thereof.
FIG. 13 is a bottom plan view thereof.
FIG. 14 is a front elevation view thereof.
FIG. 15 is a back elevation view thereof.
FIG. 16 is a left side elevation view thereof.
FIG. 17 is a right side elevation view thereof; and,
FIG. 18 is an enlarged cross sectional view taken along line 18 - 18 in FIG. 12 .
The dashed lines in FIGS. 1 - 13 represent unclaimed environment and form no part of the claimed design.
Citations
This patent cites (65)
- USD404372
- US6068548
- US6296747
- US6782843
- USD557226
- US7459057
- US8152925
- USD694790
- USD694791
- US8617672
- USD709536
- USD709537
- USD709538
- USD709539
- USD717746
- USD738451
- USD767234
- USD770992
- US9514919
- USD783922
- USD793976
- USD796458
- USD797691
- USD810705
- USD830435
- USD840364
- USD862404
- US10483092
- USD870314
- USD871609
- USD891382
- US10746207
- USD895777
- US10907667
- USD933725
- USD933726
- USD934315
- USD941372
- USD954986
- USD979524
- US11615946
- USD990441
- USD992615
- USD1005245
- USD1005974
- USD1037778
- USD1040304
- US12062527
- US2004/0077167
- US2005/0224179
- US2005/0277375
- US2006/0057826
- US2009/0050272
- US2012/0263569
- US2014/0262193
- US2016/0133504
- US2018/0142340
- US2021/0005502
- US307054816
- USD1644757
- US3009725750000
- US3010932300000
- USD215402
- USWO2021108178
- USWO2021194468
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