CMP (chemical Mechanical Planarization) Retaining Ring
Claims (1)
The ornamental design for a CMP (chemical mechanical planarization) retaining ring as shown and described.
Full Description
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FIG. 1 is a front perspective view of a CMP (chemical mechanical planarization) retaining ring showing our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a left-side view thereof;
FIG. 5 is a right-side view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof;
FIG. 8 is a bottom rear perspective view thereof;
FIG. 9 is an enlarged view of the delineated portion 9 in FIG. 1 ;
FIG. 10 is an enlarged view of the delineated portion 10 in FIG. 2 ;
FIG. 11 is an enlarged view of the delineated portion 11 in FIG. 8 ;
FIG. 12 is a cross sectional view taken through the line 12 - 12 of FIG. 6 ; and,
FIG. 13 is an enlarged view of the delineated portion 13 in FIG. 12 .
The evenly dashed broken lines in the figures depict portions of the CMP (chemical mechanical planarization) retaining ring that form no part of the claimed design. The dot-dash broken lines delineating portions of the claimed design that are illustrated in enlargements form no part of the claimed design.
Citations
This patent cites (24)
- USD699200
- USD827592
- USD839219
- USD940670
- USD979524
- USD981459
- USD1049067
- USD1051867
- USD1062662
- USD1063595
- USD1066275
- USD1071887
- USD1082729
- US1494712
- USD1639752
- USD1639752
- US1645741
- US30-0492589
- US30-0524148
- US30-0667864
- US30-0943112
- US300946104.0000
- US30-0995858
- US30-1058028