10 Patents
- US123548472025Methods and Apparatus for Conductance Liners in Semiconductor Process Chambers
APPLIED MATERIALS, Inc.
0 cites - US122550512025Multi-shape Voltage Pulse Trains for Uniformity and Etch Profile Tuning
Applied Materials, Inc.
0 cites - USD10662752025Baffle for Anti-rotation Process Kit for Substrate Processing Chamber
APPLIED MATERIALS, Inc.
0 cites - US122371482025Plasma Processing Assembly Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
0 cites - USD10490672024Ring for an Anti-rotation Process Kit for a Substrate Processing Chamber
APPLIED MATERIALS, Inc.
0 cites - 0 cites
- 0 cites
- US118481762023Plasma Processing Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
0 cites - US117767892023Plasma Processing Assembly Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
0 cites - 0 cites