Purge Ring for a Substrate Processing Chamber
Claims (1)
The ornamental design for a purge ring for a substrate processing chamber, as shown and described.
Full Description
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FIG. 1 is a top isometric view of a purge ring for a substrate processing chamber, showing our new design; FIG. 2 is a top plan view thereof; FIG. 3 is a bottom plan view thereof; FIG. 4 is a front elevation view thereof; FIG. 5 is a back elevation view thereof; FIG. 6 is a right elevation view thereof; FIG. 7 is a left elevation view thereof; and, FIG. 8 is an enlarged cross-sectional view taken along line FIG. 8 - FIG. 8 and encircled portion labeled, “ 8 ,” in FIG. 2 . The dot-dashed broken lines of a box shown in FIGS. 2 and 8 illustrate the boundary lines of the enlarged portion view of FIG. 8 and form no part of the claimed design. The dot-dashed arrows labeled, “ FIG. 8 ,” indicate the cut line of the cross-sectional view of FIG. 8 in FIG. 2 and form no part of the claimed design. The even dashed broken lines of S-shaped curves shown in the drawing of FIG. 8 define a break in length between the enlarged sections and form no part of the claimed design.
Citations
This patent cites (62)
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