Patents/Inventors

Dien-yeh Wu

San Jose, CAUS21 patents

18 Patents

USD11215762026
Purge Ring for a Substrate Processing Chamber
Applied Materials Inc.
0 cites
US125657022026
Method of Selective Metal Deposition Using Separated Reactant Activation and Plasma Discharging Zone
APPLIED MATERIALS, Inc.
0 cites
USD11123762026
Process Chamber Mixer
Applied Materials, Inc.
0 cites
USD11017092025
Process Chamber Shower Head
Applied Materials, Inc.
0 cites
US124068842025
Self Field-suppression CVD Tungsten (W) Fill on PVD W Liner
APPLIED MATERIALS, Inc.
0 cites
USD10891302025
Process Chamber Manifold
Applied Materials, Inc.
0 cites
US123879752025
Thermal Process Chamber Lid with Backside Pumping
Applied Materials, Inc.
0 cites
US122726592025
Methods for Forming Metal Gapfill with Low Resistivity
APPLIED MATERIALS, Inc.
0 cites
US122304792025
Processing Chamber with Multiple Plasma Units
Applied Materials, Inc.
0 cites
US120160922024
Gas Distribution Ceramic Heater for Deposition Chamber
APPLIED MATERIALS, Inc.
0 cites
USD10271202024
Seal for an Assembly in a Vapor Deposition Chamber
APPLIED MATERIALS, Inc.
0 cites
US119553192024
Processing Chamber with Multiple Plasma Units
Applied Materials, Inc.
0 cites
US119553812024
Low-temperature Plasma Pre-clean for Selective Gap Fill
Applied Materials, Inc.
0 cites
US117215422023
Dual Plasma Pre-clean for Selective Gap Fill
Applied Materials, Inc.
0 cites
US117156672023
Thermal Process Chamber Lid with Backside Pumping
Applied Materials, Inc.
0 cites
US116580142023
Apparatuses and Methods of Protecting Nickel and Nickel Containing Components with Thin Films
APPLIED MATERIALS, Inc.
0 cites
US115980032023
Substrate Processing Chamber Having Heated Showerhead Assembly
APPLIED MATERIALS, Inc.
0 cites
US115552442023
High Temperature Dual Chamber Showerhead
APPLIED MATERIALS, Inc.
0 cites