Deposition Ring for Physical Vapor Deposition Chamber
USD1040304No. D 1,040,304designGranted 8/27/2024
Claims (1)
Claim 1 (Independent)
The ornamental design for a deposition ring for a physical vapor deposition chamber, as shown and described.
Full Description
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FIG. 1 is a perspective view of a deposition ring for a physical vapor deposition chamber, according to the novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a front elevation view thereof.
FIG. 5 is a back elevation view thereof.
FIG. 6 is a left side elevation view thereof.
FIG. 7 is a right side elevation view thereof; and,
FIG. 8 is a cross-sectional view taken along line 8 - 8 in FIG. 2 .
The dashed lines in FIGS. 1 - 8 represent unclaimed environment forming no part of the claimed design.
Citations
This patent cites (69)
- USD244533
- USD338621
- USD379588
- US5803977
- US5863340
- USD491963
- USD497977
- US7282123
- USD557226
- US7520969
- US8221602
- USD665491
- US8596870
- USD699200
- USD703160
- USD709536
- US8911601
- USD766849
- US9472443
- USD770992
- US9534286
- US9689070
- USD793976
- USD797691
- USD799437
- USD810705
- US9909206
- US9960021
- US10103012
- USD876504
- USD888903
- USD891382
- USD933725
- USD933726
- USD937329
- USD940670
- US11390945
- US11396082
- USD992615
- US20060090706
- US20070102286
- US20070209931
- US20070283884
- US20080141942
- US20090260982
- US20100108500
- US20120042825
- US20120103257
- US20120263569
- US20130206070
- US20140190822
- US20140262763
- US20150047563
- US20160002788
- US20170002461
- US20180010242
- US20200090915
- US206573738
- US207176067
- US223429
- US223430
- USM431893
- US201413868
- USD180764
- USD181803
- USI600108
- USD188898
- USD191626
- USWO 2008/079722
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