CMP (chemical Mechanical Planarization) Retaining Ring
Claims (1)
The ornamental design for a CMP (chemical mechanical planarization) retaining ring as shown and described.
Full Description
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FIG. 1 is a front perspective view of a CMP (chemical mechanical planarization) retaining ring showing our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a left-side view thereof;
FIG. 5 is a right-side view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof;
FIG. 8 is a bottom rear perspective view thereof;
FIG. 9 is an enlarged view of the delineated portion 9 in FIG. 1 ;
FIG. 10 is an enlarged view of the delineated portion 10 in FIG. 2 ;
FIG. 11 is an enlarged view of the delineated portion 11 in FIG. 8 ;
FIG. 12 is a cross sectional view taken through the line 12 - 12 ′ of FIG. 6 ; and,
FIG. 13 is an enlarged view of the delineated portion 13 in FIG. 12 .
The evenly dashed broken lines on the CMP (chemical mechanical planarization) retaining ring depict portions of the retainer ring that form no part of the claimed design. The dot-dash broken lines illustrate boundaries of enlarged views that form no part of the claimed design.
Citations
This patent cites (81)
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