Electrode Cover for a Plasma Processing Apparatus
Claims (1)
The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.
Full Description
Show full text →
FIG. 1 is a front, bottom, and right side perspective view of an electrode cover for a plasma processing apparatus according to the design;
FIG. 2 is a rear, bottom, and left side perspective view thereof;
FIG. 3 is a rear, bottom, and right side perspective view thereof;
FIG. 4 is a front view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a right side view thereof;
FIG. 7 is a top plan view thereof;
FIG. 8 is a bottom plan view thereof;
FIG. 9 is a rear view thereof;
FIG. 10 is a cross-sectional view taken along line 10 - 10 of FIG. 4 ;
FIG. 11 is an enlarged view of the portion shown in box, labeled, “ FIG. 11 ,” in FIG. 10 ;
FIG. 12 is an enlarged front, bottom, and right side perspective view of the cross-sectional view taken along line 10 - 10 of FIG. 4 ;
FIG. 13 is an enlarged rear, bottom, and right side perspective view of the cross-sectional view taken along line 10 - 10 of FIG. 4 ; and,
FIG. 14 is an enlarged rear, bottom, and left side perspective view of the cross-sectional view taken along line 10 - 10 of FIG. 4 .
The dot-dash line box shown in FIG. 10 defines the enlarged portion view shown in FIG. 11 and forms no part of the claimed design.
Citations
This patent cites (26)
- USD667561
- USD703160
- USD789888
- USD794753
- USD802545
- USD840364
- USD868993
- USD870314
- USD871609
- USD874617
- USD877931
- USD891636
- USD900760
- USD901407
- USD924824
- USD934994
- USD950013
- USD958401
- US20220038802
- US127551
- USD1112133
- USD1624794
- USD1659287
- USD1678330
- USD1729106
- USD1733645
Cited by (0)
- USD1121576: Purge Ring for a Substrate Processing Chamber
- USD1110288: Heat Insulation Pedestal of a Semiconductor Manufacturing Apparatus
- USD1113774: Susceptor
- US12553133: Substrate Handling System, Method, and Apparatus
- USD1115719: Lower Edge Ring of a Process Kit for Semiconductor Substrate Processing
- USD1115720: Lower Edge Ring of a Process Kit for Semiconductor Substrate Processing
- USD1082730: Cover Base for Susceptors
- USD1083043: Composite Seal Member for Semiconductor Production Apparatus
- USD1069863: Deposition Ring of a Process Kit for Semiconductor Substrate Processing
- USD1066275: Baffle for Anti-rotation Process Kit for Substrate Processing Chamber
- USD1064005: Grounding Ring of a Process Kit for Semiconductor Substrate Processing
- USD1049067: Ring for an Anti-rotation Process Kit for a Substrate Processing Chamber