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Patents/USD1115719

Lower Edge Ring of a Process Kit for Semiconductor Substrate Processing

USD1115719No. D 1,115,719designGranted 3/3/2026

Claims (1)

Claim 1 (Independent)

The ornamental design for a lower edge ring of a process kit for semiconductor substrate processing, as shown and described.

Full Description

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FIG. 1 is a top plan view of a lower edge ring of a process kit for semiconductor substrate processing, showing our new design. FIG. 2 is a bottom plan view thereof. FIG. 3 is a front elevation view thereof, the back, left, and right side elevation views are identical. FIG. 4 is a top isometric view thereof. FIG. 5 is a bottom isometric view thereof; and, FIG. 6 is an enlarged cross-sectional view taken along line 6 - 6 and encircled portions labeled, “ FIG. 6 ,” in FIG. 1 . The hatch lines in the cross-section of FIG. 6 represent unclaimed internal environment and form no part of the claimed design. The dashed break lines in FIG. 6 represent unclaimed environment and form no part of the claimed design. In FIG. 6 the design is shown with a symbolic break shown in broken lines in its length to provide an enlarged view of cross-sectional detail of the claimed design.

Citations

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