CMP (chemical Mechanical Planarization) Retaining Ring
Claims (1)
The ornamental design for a CMP (chemical mechanical planarization) retaining ring as shown and described.
Full Description
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FIG. 1 is a front perspective view of a CMP (chemical mechanical planarization) retaining ring showing our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a left-side view thereof;
FIG. 5 is a right-side view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof;
FIG. 8 is a bottom rear perspective view thereof;
FIG. 9 is an enlarged view of the delineated portion 9 in FIG. 1 ;
FIG. 10 is an enlarged view of the delineated portion 10 in FIG. 2 ;
FIG. 11 is an enlarged view of the delineated portion 11 in FIG. 8 ;
FIG. 12 is a cross sectional view taken through the line 12 - 12 ′ of FIG. 6 ; and,
FIG. 13 is an enlarged view of the delineated portion 13 in FIG. 12 .
The evenly dashed broken lines in the figures depict portions of the CMP (chemical mechanical planarization) retaining ring and form no part of the claimed design. The dot-dash broken lines delineating portions of the claimed design that are illustrated in enlargements form no part of the claimed design.
Citations
This patent cites (34)
- US7597609
- US8517803
- USD716742
- USD724553
- USD734377
- US9227297
- USD766849
- USD767234
- USD770992
- USD783922
- USD793976
- USD794585
- USD799437
- USD815385
- USD845568
- USD871608
- USD876504
- USD917825
- USD940670
- USD981459
- US2003/0070757
- US2004/0065412
- US2004/0077167
- US2007/0224864
- US2008/0171500
- US2011/0065368
- US2012/0309276
- US2015/0050870
- US2018/0021918
- US2018/0264621
- USD1494712
- USD1639752
- US30-0524148
- US30-0667864