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Patents/USD1062662

CMP (chemical Mechanical Planarization) Retaining Ring

USD1062662No. D 1,062,662designGranted 2/18/2025

Claims (1)

Claim 1 (Independent)

The ornamental design for a CMP (chemical mechanical planarization) retaining ring as shown and described.

Full Description

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FIG. 1 is a front perspective view of a CMP (chemical mechanical planarization) retaining ring showing our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a left-side view thereof;

FIG. 5 is a right-side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a bottom rear perspective view thereof;

FIG. 9 is an enlarged view of the delineated portion 9 in FIG. 1 ;

FIG. 10 is an enlarged view of the delineated portion 10 in FIG. 2 ;

FIG. 11 is an enlarged view of the delineated portion 11 in FIG. 8 ;

FIG. 12 is a cross sectional view taken through the line 12 - 12 ′ of FIG. 6 ; and,

FIG. 13 is an enlarged view of the delineated portion 13 in FIG. 12 .

The evenly dashed broken lines in the figures depict portions of the CMP (chemical mechanical planarization) retaining ring and form no part of the claimed design. The dot-dash broken lines delineating portions of the claimed design that are illustrated in enlargements form no part of the claimed design.

Citations

This patent cites (34)

  • US7597609
  • US8517803
  • USD716742
  • USD724553
  • USD734377
  • US9227297
  • USD766849
  • USD767234
  • USD770992
  • USD783922
  • USD793976
  • USD794585
  • USD799437
  • USD815385
  • USD845568
  • USD871608
  • USD876504
  • USD917825
  • USD940670
  • USD981459
  • US2003/0070757
  • US2004/0065412
  • US2004/0077167
  • US2007/0224864
  • US2008/0171500
  • US2011/0065368
  • US2012/0309276
  • US2015/0050870
  • US2018/0021918
  • US2018/0264621
  • US1645741
  • US30-0492589
  • US30-0995858
  • US30-1058028