Cover Ring for Use in Semiconductor Processing Chamber
USD1038049No. D 1,038,049designGranted 8/6/2024
Claims (1)
Claim 1 (Independent)
The ornamental design for a cover ring for use in a semiconductor processing chamber, as shown and described.
Full Description
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FIG. 1 is a bottom isometric view of a cover ring for use in a semiconductor processing chamber in accordance with some embodiments.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a front elevation view thereof.
FIG. 5 is a back elevation view thereof.
FIG. 6 is a right side elevation view thereof; and,
FIG. 7 is a left side elevation view thereof.
The broken lines in the drawings illustrate portions of the cover ring for use in a semiconductor processing chamber that form no part of the claimed design.
Citations
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Cited by (0)
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- USD1121576: Purge Ring for a Substrate Processing Chamber
- USD1121578: Shield for Plasma Chambers
- USD1113774: Susceptor
- USD1098057: Susceptor Cover
- USD1096676: Cover Base for Susceptors
- USD1096679: Debubbler Component
- USD1094320: Susceptor
- USD1094321: Susceptor Cover
- USD1094322: Susceptor
- USD1094323: Susceptor Unit
- USD1093328: Susceptor
- USD1091491: Debubbler Component
- USD1090468: Debubbler Component
- USD1082728: Susceptor
- USD1082729: Susceptor Cover
- USD1082730: Cover Base for Susceptors
- USD1082731: Susceptor
- USD1073758: Baffle for Substrate Processing System