Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US11745213utility2023
Substrate Processing Apparatus and Apparatus Cleaning Method
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US11745202utility2023
Dry Non-plasma Treatment System
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US11738363utility2023
Bath Systems and Methods Thereof
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US11740643utility2023
Temperature Control Device and Method, and Inspection Apparatus
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US11742223utility2023
Substrate Processing Apparatus
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US11742180utility2023
Plasma Processing Method and Plasma Processing Apparatus
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US11742181utility2023
Control Method and Plasma Processing Apparatus
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US11742182utility2023
Control Method and Plasma Processing Apparatus
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US11742183utility2023
Plasma Processing Apparatus and Control Method
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US11742184utility2023
Plasma Processing Apparatus and Plasma Processing Method
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US11742188utility2023
Substrate Processing Method, Pressure Control Apparatus and Substrate Processing System
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US11742190utility2023
Sputtering Apparatus and Film Forming Method
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US11742232utility2023
Substrate Processing Method and Substrate Processing Apparatus
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US11742226utility2023
Substrate Liquid Processing Apparatus
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US11742228utility2023
Substrate Processing Method and Substrate Processing System
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US11742241utility2023
ALD (atomic Layer Deposition) Liner for via Profile Control and Related Applications
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US11743973utility2023
Placing Table and Plasma Processing Apparatus
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US11731229utility2023
Substrate Processing Apparatus, Substrate Processing Method, and Storage Medium
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US11732357utility2023
Substrate Processing Method and Substrate Processing Apparatus
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US11733612utility2023
Substrate Processing Apparatus and Method of Processing Substrate
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