Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US11735392utility2023
Plasma Processing Apparatus
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US11735402utility2023
Measurement Method and Measurement Apparatus
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US11735423utility2023
Workpiece Processing Method
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US11735428utility2023
Substrate Processing Method and Substrate Processing Apparatus
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US11735439utility2023
Substrate Processing System and Method for Supplying Processing Fluid
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US11735444utility2023
Stage and Plasma Processing Apparatus
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US11735448utility2023
Container, Container Partition Plate, Substrate Processing System, and Substrate Transfer Method
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US11735465utility2023
Substrate Processing Apparatus and Substrate Processing Method
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US11735525utility2023
Power Delivery Network for CFET with Buried Power Rails
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US11737276utility2023
Method of Manufacturing Semiconductor Device and Semiconductor Device
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US11728176utility2023
Treatment Method
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US11724235utility2023
Mixing Apparatus, Mixing Method and Substrate Processing System
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US11725276utility2023
Plasma Purge Method
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US11725281utility2023
Gas Introduction Structure, Thermal Processing Apparatus and Gas Supply Method
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US11725284utility2023
Substrate Processing Apparatus and Substrate Processing Method
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US11726409utility2023
Substrate Processing System, Liquid Amount Measuring Method, Computer-readable Recording Medium, and Measuring Jig
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US11726438utility2023
Treatment Condition Setting Method, Storage Medium, and Substrate Treatment System
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US11728144utility2023
Edge Ring and Substrate Processing Apparatus
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US11728166utility2023
Substrate Processing Method and Substrate Processing Apparatus
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US11728135utility2023
Electric Pressure Systems for Control of Plasma Properties and Uniformity
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