Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12060640utility2024
Film Forming Method and System
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US12060635utility2024
Hard Mask, Substrate Processing Method, and Substrate Processing Apparatus
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US12063717utility2024
Plasma Processing Apparatus, and Temperature Control Method
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US12062559utility2024
Substrate Processing System, Substrate Processing Method, and Control Program
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US12062557utility2024
Substrate Processing System and Particle Removal Method
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US12062527utility2024
Baffle Unit and Substrate Processing Apparatus
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US12056261utility2024
License Authentication Device and License Authentication Method
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US12054828utility2024
Substrate Processing Method and Substrate Processing Apparatus
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US12054824utility2024
Substrate Processing Method and Substrate Processing Apparatus
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US12057327utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US12057326utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US12057294utility2024
Plasma Processing Apparatus and Plasma Processing Method
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US12057293utility2024
Methods for Real-time Pulse Measurement and Pulse Timing Adjustment to Control Plasma Process Performance
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US12051595utility2024
Plasma Processing Method and Plasma Processing Apparatus
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US12051571utility2024
Substrate Processing Method and Substrate Processing System
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US12051570utility2024
Plasma Processing Apparatus
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US12051566utility2024
Plasma Processing Apparatus
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US12051189utility2024
Estimation Model Creation Device, Estimation Model Creation Method, and Storage Medium
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US12049694utility2024
Method for Depositing Boron Nitride Film and Film Deposition Apparatus
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US12051605utility2024
Substrate Processing Apparatus
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