Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12165848utility2024
Substrate Processing Method, Substrate Processing Apparatus, and Method for Producing Nanowire or Nanosheet Transistor
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US12165846utility2024
Plasma Processing Apparatus and Plasma Processing Method
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US12165842utility2024
Control Method and Plasma Processing Apparatus
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US12163898utility2024
Method and Apparatus for Detecting Abnormal Growth of Graphene
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US12163220utility2024
Deposition Method and Deposition Apparatus
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US12163215utility2024
Film Forming Apparatus and Film Forming Method
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US12157293utility2024
Separating Method, Separating Apparatus, and Separating System
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US12159798utility2024
Transfer Detection Method and Substrate Processing Apparatus
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US12158374utility2024
Time-resolved OES Data Collection
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US12159771utility2024
Plasma Processing Apparatus
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US12154792utility2024
Plasma Etching Method
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US12154798utility2024
Temperature Measurement Unit, Heat Treatment Apparatus, and Temperature Measurement Method
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US12154793utility2024
Etching Apparatus and Etching Method
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US12154790utility2024
Etching Method and Plasma Processing Apparatus
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US12154767utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US12154761utility2024
Plasma Processing Apparatus and Plasma Processing Method
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US12154760utility2024
Inductively-coupled Plasma Processing Apparatus
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US12152304utility2024
Film Forming Method for Forming Self-assembled Monolayer on Substrate
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US12152298utility2024
Powder Conveying Apparatus, Gas Supply Apparatus, and Method for Removing Powder
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US12151255utility2024
Coating Apparatus and Coating Method
0 cites

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