Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12173405utility2024
Processing Apparatus and Processing Method
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US12173401utility2024
Method for Manufacturing Semiconductor Device, and Film-forming Device
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US12168825utility2024
Film Formation Method and Film Formation Device
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US12170326utility2024
Three-dimensional Device with Vertical Core and Bundled Wiring
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US12170217utility2024
Substrate Processing Apparatus and Abnormality Detection Method
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US12170216utility2024
Transfer Device, Processing System, and Transfer Method
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US12170209utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US12170198utility2024
Deposition Method and Plasma Processing Apparatus
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US12170193utility2024
Temperature Estimation Apparatus, Plasma Processing System, Temperature Estimation Method and Temperature Estimation Program
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US12170187utility2024
Gas Supply System, Plasma Processing Apparatus, and Gas Supply Method
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US12165849utility2024
Plasma Processing Apparatus and Etching Method
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US12165870utility2024
Chemical Amplification Methods and Techniques for Developable Bottom Anti-reflective Coatings and Dyed Implant Resists
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US12165937utility2024
Optical Diagnostics of Semiconductor Process Using Hyperspectral Imaging
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US12165893utility2024
Substrate Processing System and Transfer Method
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US12167542utility2024
Method for Manufacturing Substrate with Sensor
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US12165892utility2024
Control Device, System and Control Method
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US12165908utility2024
Vacuum Processing Apparatus and Method of Controlling Vacuum Processing Apparatus
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US12165896utility2024
Substrate Support and Substrate Processing Apparatus
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US12165854utility2024
Substrate Support and Substrate Processing Apparatus
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US12165850utility2024
Electrode for Plasma Processing Apparatus and Plasma Processing Apparatus
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