Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12148632utility2024
Substrate Processing Apparatus and Cleaning Method of Mist Guard
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US12148147utility2024
Substrate Inspection Device, Substrate Inspection Method, and Storage Medium
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US12148687utility2024
Split Substrate Interposer with Integrated Passive Device
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US12148668utility2024
Stackable Semiconductor Device with 2D Material Layer and Methods of Manufacturing Thereof
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US12148637utility2024
Substrate Processing Apparatus
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US12148636utility2024
Substrate Support
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US12148625utility2024
Methods to Prevent Surface Charge Induced Cd-dependent Etching of Material Formed Within Features on a Patterned Substrate
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US12148624utility2024
Wet Etch Process and Method to Control Fin Height and Channel Area in a Fin Field Effect Transistor (finfet)
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US12148600utility2024
Deposition-condition Output Device, Method for Outputting Deposition Condition, Recording Medium and Depositon Apparatus
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US12148598utility2024
Plasma Processing Apparatus
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US12142501utility2024
Substrate Processing System and Temperature Control Method
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US12142484utility2024
Etching Method
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US12142506utility2024
Substrate Transfer Apparatus, Substrate Processing System and Substrate Processing Method
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US12142483utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US12142496utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US12142495utility2024
Etching Method and Etching Apparatus
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US12142474utility2024
Substrate Processing Method and Substrate Processing System
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US12142465utility2024
Plasma Processing Method and Plasma Processing Apparatus
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US12142462utility2024
Method of Reducing Leakage of Heat Transfer Gas and Plasma Processing Apparatus
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US12136535utility2024
Plasma Processing Apparatus and Plasma Processing Method
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