Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12256558utility2025
Technologies for Fabricating a 3D Memory Structure
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US12255081utility2025
Substrate Processing Apparatus and Substrate Processing Method
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US12255063utility2025
Substrate Processing System and Substrate Processing Method
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US12255049utility2025
Plasma Processing Apparatus and Plasma Processing Method
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US12253838utility2025
Information Processing Device, Recording Medium, and Process Condition Search Method
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US12253559utility2025
Alignment Method and Inspection Apparatus
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US12252786utility2025
Cleaning Method and Substrate Processing Apparatus
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US12247768utility2025
Electrocaloric Effect Element, Heat Transfer Device, Semiconductor Manufacturing Device, and Electrocaloric Effect Element Control Method
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US12247287utility2025
Apparatus for Performing Film Forming Process on Substrate and Method of Using Vacuum Chuck Mechanism Provided in the Apparatus
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US12249508utility2025
Selective Patterning with Wet-dry Bilayer Resist
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US12249659utility2025
2D Materials with Inverted Gate Electrode for High Density 3D Stacking
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US12249533utility2025
Substrate Processing Apparatus
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US12249527utility2025
Substrate Transport Apparatus and Substrate Transport Method
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US12249487utility2025
Plasma Processing Apparatus and Plasma Processing Method
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US12249486utility2025
Plasma Processing Apparatus and Plasma Processing Method
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US12243718utility2025
Plasma Processing Method and Plasma Processing Apparatus
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US12240012utility2025
Coating Film Forming Method, Coating Film Forming Apparatus, and Storage Medium
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US12244972utility2025
Substrate Processing Monitoring Apparatus Based on Imaging Video Data, Substrate Processing Apparatus, Substrate Processing Monitoring Method, and Storage Medium
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US12243920utility2025
Method to Form Selective High-k Deposition on 2D Materials
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US12243752utility2025
Systems for Etching a Substrate Using a Hybrid Wet Atomic Layer Etching Process
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