Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12354853utility2025
Etching Method and Plasma Etching Apparatus
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US12354837utility2025
Plasma Processing Method and Plasma Processing Apparatus
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US12354846utility2025
Plasma Processing Apparatus
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US12354842utility2025
In-situ Focus Ring Coating
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US12354841utility2025
Substrate Processing Device, Substrate Processing System, Control Method for Substrate Processing Device, and Control Method for Substrate Processing System
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US12351904utility2025
Film Deposition Method and Method for Forming Polycrystalline Silicon Film
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US12356706utility2025
Methods for Forming High Performance Three Dimensionally Stacked Transistors Based on Dielectric Nano Sheets
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US12351905utility2025
Film Forming Method and Film Forming Apparatus
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US12347651utility2025
Etching Method and Plasma Processing Apparatus
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US12349424utility2025
Epitaxial Semiconductor 3D Horizontal Nano Sheet with High Mobility 2D Material Channel
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US12347654utility2025
Plasma Processing Apparatus
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US12349434utility2025
Manufacturing Method for Semiconductor Device
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US12344933utility2025
Sin Film Embedding Method
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US12347671utility2025
Semiconductor Device Manufacturing Method and Semiconductor Device Manufacturing System
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US12347658utility2025
Stage and Plasma Processing Apparatus
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US12347645utility2025
Substrate Processing Method and Substrate Processing Apparatus
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US12344930utility2025
Deposition Method and Deposition Apparatus
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US12347676utility2025
Substrate Processing Method and Substrate Processing System
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US12347649utility2025
Plasma Processing Apparatus and Lid Member
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US12347698utility2025
Liquid Processing Apparatus and Liquid Processing Method
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