Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12347651utility2025
Etching Method and Plasma Processing Apparatus
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US12347645utility2025
Substrate Processing Method and Substrate Processing Apparatus
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US12338532utility2025
Plasma Processing Method and Plasma Processing Apparatus
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US12341046utility2025
Transfer Apparatus and Transfer Method
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US12341039utility2025
Substrate Processing Apparatus and Temperature Regulation Method
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US12342603utility2025
Plurality of Devices in Adjacent 3D Stacks in Different Circuit Locations
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US12342568utility2025
3D Device with a Plurality of Core Wiring Layout Architecture
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US12341053utility2025
System for Backside Deposition of a Substrate
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US12341020utility2025
Substrate Processing Method and Substrate Processing Apparatus
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US12341009utility2025
Variable Hardness Amorphous Carbon Mask
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US12341006utility2025
Heat Treatment Method and Heat Treatment Apparatus
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US12341004utility2025
Film Formation Method and Film Formation Apparatus
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US12341001utility2025
Cleaning Method and Plasma Processing Apparatus
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US12340986utility2025
Plasma Processing Apparatus and Plasma Processing Method
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US12340985utility2025
Plasma Processing Apparatus and Plasma Processing Method
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US12341008utility2025
Heat Treatment Device and Treatment Method
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US12340975utility2025
Plasma Processing Apparatus
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US12340977utility2025
Plasma Source and Plasma Processing Apparatus
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US12339593utility2025
Developing Method and Substrate Treatment System
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US12334391utility2025
Method for Patterning a Substrate Using Photolithography
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