- US11700721utility2023Structures and Methods for Forming Dynamic Random-access Devices0 cites
- US11699755utility2023Stress Incorporation in Semiconductor Devices0 cites
- US11699651utility2023Fan-out Interconnect Integration Processes and Structures0 cites
- US11699634utility2023Water Cooled Plate for Heat Management in Power Amplifiers0 cites
- US11699628utility2023Nitrogen-rich Silicon Nitride Films for Thin Film Transistors0 cites
- US11699623utility2023Systems and Methods for Analyzing Defects in CVD Films0 cites
- US11699611utility2023Forming Mesas on an Electrostatic Chuck0 cites
- US11699602utility2023Substrate Support Assemblies and Components0 cites
- US11699595utility2023Imaging for Monitoring Thickness in a Substrate Cleaning System0 cites
- US11699585utility2023Methods of Forming Hardmasks0 cites
- US11699577utility2023Treatment for High-temperature Cleans0 cites
- US11699572utility2023Feedback Loop for Controlling a Pulsed Voltage Waveform0 cites
- US11699571utility2023Semiconductor Processing Chambers for Deposition and Etch0 cites
- US11692268utility2023Gas Diffusion Shower Head Design for Large Area Plasma Enhanced Chemical Vapor Deposition0 cites
- US11691244utility2023Multi-toothed, Magnetically Controlled Retaining Ring0 cites
- US11691872utility2023Pore Formation in a Substrate0 cites
- US11692261utility2023Evaporator Chamber for Forming Films on Substrates0 cites
- US11692262utility2023EM Source for Enhanced Plasma Control0 cites
- US11692265utility2023Gas Injection for De-agglomeration in Particle Coating Reactor0 cites
- US11692267utility2023Plasma Induced Modification of Silicon Carbide Surface0 cites