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Patents/USD1042731

Gas Nozzle for Semiconductor Manufacturing Equipment

USD1042731No. D 1,042,731designGranted 9/17/2024

Claims (1)

Claim 1 (Independent)

The ornamental design for a gas nozzle for semiconductor manufacturing equipment, as shown and described.

Full Description

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FIG. 1 is a front, top and left side perspective view of a gas nozzle for semiconductor manufacturing equipment, showing my new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof; and,

FIG. 8 is an enlarged cross-sectional view taken along line 8 - 8 in FIG. 2 .

The broken lines are included for the purpose of illustrating portions of the article that form no part of the claimed design.

Citations

This patent cites (21)

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