Gas Nozzle for Semiconductor Manufacturing Equipment
USD1042731No. D 1,042,731designGranted 9/17/2024
Claims (1)
Claim 1 (Independent)
The ornamental design for a gas nozzle for semiconductor manufacturing equipment, as shown and described.
Full Description
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FIG. 1 is a front, top and left side perspective view of a gas nozzle for semiconductor manufacturing equipment, showing my new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a left side elevational view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof;
FIG. 7 is a rear elevational view thereof; and,
FIG. 8 is an enlarged cross-sectional view taken along line 8 - 8 in FIG. 2 .
The broken lines are included for the purpose of illustrating portions of the article that form no part of the claimed design.
Citations
This patent cites (21)
- US4880163
- US5135170
- USD336096
- USD641830
- USD771543
- USD771772
- USD783351
- USD828091
- USD847301
- US10364498
- USD888196
- USD889596
- USD890572
- US10960415
- USD937385
- USD965740
- USD1020668
- US20120167824
- USD1534651
- USD1563524
- USD1605945