Patents.us
Patents/USD1109711

Gas Nozzle for a Substrate Processing Apparatus

USD1109711No. D 1,109,711designGranted 1/20/2026

Claims (1)

Claim 1 (Independent)

The ornamental design for a gas nozzle for a substrate processing apparatus, as shown and described.

Full Description

Show full text →

FIG. 1 is a front, bottom and left side perspective view of a gas nozzle for a substrate processing apparatus, showing our new design; FIG. 2 is a front elevational view thereof; FIG. 3 is a top plan view thereof; FIG. 4 is a bottom plan view thereof; and FIG. 5 is a rear elevational view thereof; FIG. 6 is a left side elevational view thereof; FIG. 7 is a right side elevational view thereof; FIG. 8 is a cross sectional view taken along line 8 - 8 in FIG. 2 ; FIG. 9 is an enlarged portion view taken from encircled portion labeled, “ 9 ,” in FIG. 1 ; FIG. 10 is a cross sectional view taken along line 10 - 10 in FIG. 2 ; FIG. 11 is a cross sectional view taken along line 11 - 11 in FIG. 2 ; FIG. 12 is an enlarged view of FIG. 6 ; and, FIG. 13 is an enlarged view of FIG. 7 . The dot-dashed lines shown in FIGS. 1 and 9 represent boundary lines of the enlarged portion view of FIG. 9 and form no part of the claimed design.

Citations

This patent cites (37)

  • USD258309
  • US4880163
  • USD447921
  • USD502985
  • USD613116
  • USD617870
  • USD645118
  • USD783351
  • USD828091
  • US10364498
  • USD888196
  • USD889596
  • USD890572
  • USD901564
  • US11020760
  • USD924953
  • USD964443
  • USD965740
  • USD991416
  • USD1020668
  • USD1042731
  • USD1084222
  • US2007/0131168
  • US2009/0205631
  • US2009/0291566
  • US2011/0098841
  • US2015/0240359
  • US2017/0051408
  • US2018/0087156
  • US303532538
  • USD1520999
  • USD1534651
  • USD1644261
  • US300751382
  • US300829255
  • US300829256
  • US300996682