Gas Nozzle for a Substrate Processing Apparatus
Claims (1)
The ornamental design for a gas nozzle for a substrate processing apparatus, as shown and described.
Full Description
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FIG. 1 is a front, bottom and left side perspective view of a gas nozzle for a substrate processing apparatus, showing our new design; FIG. 2 is a front elevational view thereof; FIG. 3 is a top plan view thereof; FIG. 4 is a bottom plan view thereof; and FIG. 5 is a rear elevational view thereof; FIG. 6 is a left side elevational view thereof; FIG. 7 is a right side elevational view thereof; FIG. 8 is a cross sectional view taken along line 8 - 8 in FIG. 6 ; FIG. 9 is an enlarged portion view taken from encircled portion labeled, “ 9 ,” in FIG. 1 ; FIG. 10 is an enlarged view of FIG. 6 ; and, FIG. 11 is an enlarged view of FIG. 7 . The even dashed broken lines in the drawings represent portions of the gas nozzle for a substrate processing apparatus that form no part of the claimed design. The dot-dashed lines shown in FIGS. 1 , 8 and 9 represent boundary lines and form no part of the claimed design.
Citations
This patent cites (37)
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