Patents/Inventors

Takashi Nakagawa

HitachinakaJP41 patents

35 Patents

US126203572026
Display Device and Electronic Device
Semiconductor Energy Laboratory Co., Ltd.
0 cites
US126123132026
Method for Producing Lithium Halide Compound
IDEMITSU KOSAN CO., Ltd.
0 cites
US125463772026
Shock Absorber
HONDA MOTOR CO., Ltd.
0 cites
US125369692026
Display Device
Semiconductor Energy Laboratory Co., Ltd.
0 cites
US124694632025
Display Device and Electronic Device
Semiconductor Energy Laboratory Co., Ltd.
0 cites
US124227702025
Image Forming Apparatus That Sets Cooling Time of a Fixing Device
SHARP KABUSHIKI KAISHA
0 cites
US124008742025
Processing Method, Method of Manufacturing Semiconductor Device, Processing Apparatus, and Recording Medium
KOKUSAI ELECTRIC CORPORATION
0 cites
US123810912025
Method of Processing Substrate, Method of Manufacturing Semiconductor Device, Recording Medium, and Substrate Processing Apparatus
Kokusai Electric Corporation
0 cites
US123745442025
Processing Method, Method of Manufacturing Semiconductor Device, Processing Apparatus, and Recording Medium
Kokusai Electric Corporation
0 cites
US123669662025
Memory System
Kioxia Corporation
0 cites
US122781032025
Method of Processing Substrate and Method of Manufacturing Semiconductor Device by Forming Film
KOKUSAI ELECTRIC CORPORATION
0 cites
US122773572025
Related Information Providing Method for Image Processing, Image Processing System, and Image Processing Device
SHARP KABUSHIKI KAISHA
0 cites
US122370212025
Memory System
Kioxia Corporation
0 cites
US122059652025
Imaging Device and Electronic Device
Semiconductor Energy Laboratory Co., Ltd.
0 cites
US122009952025
Display Device and Electronic Device
Semiconductor Energy Laboratory Co., Ltd.
0 cites
US121839202024
Porous Dielectric Particle, Electrode for Lithium Ion Secondary Battery, and Lithium Ion Secondary Battery
HONDA MOTOR CO., Ltd.
0 cites
US121657252024
Memory System and Method
Kioxia Corporation
0 cites
US120370752024
Shock Absorber
Hitachi Astemo, Ltd.
0 cites
US120338522024
Method of Processing Substrate, Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
KOKUSAI ELECTRIC CORPORATION
0 cites
US120270912024
Display Device
Semiconductor Energy Laboratory Co., Ltd.
0 cites
US119979102024
Sensor Device and Semiconductor Device
Semiconductor Energy Laboratory Co., Ltd.
0 cites
US119339742024
Glasses-type Electronic Device
Semiconductor Energy Laboratory Co., Ltd.
0 cites
US119231912024
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus, and Recording Medium
Kokusai Electric Corporation
0 cites
US118942392024
Method of Processing Substrate, Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
KOKUSAI ELECTRIC CORPORATION
0 cites
US118945412024
Electrode for Lithium Ion Secondary Battery, and Lithium Ion Secondary Battery
HONDA MOTOR CO., Ltd.
0 cites
US118626492024
Imaging Device, Operation Method Thereof, and Electronic Device
Semiconductor Energy Laboratory Co., Ltd.
0 cites
US118482032023
Methods of Processing Substrate and Manufacturing Semiconductor Device by Forming Film, Substrate Processing Apparatus, and Recording Medium
KOKUSAI ELECTRIC CORPORATION
0 cites
US118112812023
Stator Structure and Resolver
MINEBEA MITSUMI Inc.
0 cites
US117984912023
Display Device and Electronic Device
Semiconductor Energy Laboratory Co., Ltd.
0 cites
US117283552023
Imaging Device and Electronic Device
Semiconductor Energy Laboratory Co., Ltd.
0 cites
US116995932023
Method of Manufacturing Semiconductor Device, Substrate Processing Method, Substrate Processing Apparatus, and Recording Medium
KOKUSAI ELECTRIC CORPORATION
0 cites
US116260522023
Display Device
Semiconductor Energy Laboratory Co., Ltd.
0 cites
US116267842023
Stator Structure and Resolver
MINEBEA MITSUMI Inc.
0 cites
US116006452023
Imaging Device, Operation Method Thereof, and Electronic Device
SEMICONDUCTOR ENERGY LABORATORY CO., Ltd.
0 cites
US115435632023
Optical Functional Resin Panel Having Layers of Increasing Surface Hardness
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., Ltd.
0 cites