Douglas Walter Agnew

9 Patents

• USD11076702025

  Showerhead for a Substrate Processing System

  LAM RESEARCH CORPORATION

  0 cites
• US124736332025

  Plasma Enhanced Atomic Layer Deposition of Silicon-containing Films

  Lam Research Corporation

  0 cites
• US124313492025

  In-situ Control of Film Properties During Atomic Layer Deposition

  Lam Research Corporation

  0 cites
• US124179432025

  Reducing Intralevel Capacitance in Semiconductor Devices

  Lam Research Corporation

  0 cites
• US124008802025

  Apparatuses for Uniform Fluid Delivery in a Multi-station Semiconductor Processing Chamber

  Lam Research Corporation

  0 cites
• US122527822025

  In-situ PECVD Cap Layer

  Lam Research Corporation

  0 cites
• US121579452024

  Thermal Atomic Layer Deposition of Silicon-containing Films

  Lam Research Corporation

  0 cites
• US120875742024

  Oxidative Conversion in Atomic Layer Deposition Processes

  Lam Research Corporation

  0 cites
• US120209232024

  Low-κ ALD Gap-fill Methods and Material

  Lam Research Corporation

  0 cites