31 Patents
- US125637542026Hybrid Decoupling Capacitor and Method Forming Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US124842802025Silicide-layer-coupled Doped Portion of Active Region and Method of Fabricating Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124514302025Method of Fabricating Semiconductor Devices Having Different Architectures and Semiconductor Devices Fabricated Thereby
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124463212025Circuits Designed and Manufactured with First and Second Fin Boundaries
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US124084262025Circuits Designed and Manufactured with First and Second Design Rules
Taiwan Semiconductor Manufacturing Company, Ltd.
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- US121990302025Semiconductor Devices Including Decoupling Capacitors
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121659722024Method of Manufacturing Conductive Lines in a Circuit
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
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- US120936272024Semiconductor Device, and Method of Forming Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
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- US120210332024Integrated Circuit Device Having Active Region Coupled to Metal Layers on Opposite Sides of Substrate, and Method
TAIWAN SEMICONDUCTOR MANUFACTURING Ltd.
0 cites - US119844442024Semiconductor Device and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - US119676212024Silicide-sandwiched Source/drain Region and Method of Fabricating Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US119012832024Capacitor and Method for Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US119012892024Semiconductor Device Structure with Resistive Element
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US118375352023Semiconductor Devices Including Decoupling Capacitors
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US118174522023Method for Forming Decoupling Capacitors Between the Interposing Conductors and the Multiple Gates
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
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- US116769572023Integrated Circuit Device, System and Method
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
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- US115630952023Silicide-sandwiched Source/drain Region and Method of Fabricating Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites