Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US11776824utility2023
Processing Liquid Ejection Nozzle, Nozzle Arm, Substrate Processing Apparatus, and Substrate Processing Method
0 cites
US11772138utility2023
Processing Apparatus and Processing Method, and Gas Cluster Generating Apparatus and Gas Cluster Generating Method
0 cites
US11768236utility2023
Test Device Control Method and Test Device
0 cites
US11769831utility2023
High Performance Floating Body VFET with Dielectric Core
0 cites
US11769677utility2023
Substrate Processing Tool with Integrated Metrology and Method of Using
0 cites
US11769661utility2023
Substrate Processing Method and Substrate Processing Apparatus
0 cites
US11762297utility2023
Point-of-use Blending of Rinse Solutions to Mitigate Pattern Collapse
0 cites
US11763161utility2023
Enhanced Resolution in Semiconductor Fabrication Data Acquisition Instruments Using Machine Learning
0 cites
US11764040utility2023
Placing Table and Substrate Processing Apparatus
0 cites
US11764034utility2023
Plasma Processing Method and Plasma Processing Apparatus
0 cites
US11764038utility2023
Plasma Processing Apparatus, Electrostatic Attraction Method, and Electrostatic Attraction Program
0 cites
US11764070utility2023
Etching Method and Etching Apparatus
0 cites
US11764082utility2023
Control Method and Plasma Processing Apparatus
0 cites
US11764092utility2023
Substrate Transfer Apparatus and Substrate Processing System
0 cites
US11761075utility2023
Substrate Cleaning Apparatus
0 cites
US11764200utility2023
High Density Architecture Design for 3D Logic and 3D Memory Circuits
0 cites
US11764266utility2023
Three-dimensional Semiconductor Device
0 cites
US11765879utility2023
Substrate Processing Apparatus and Monitoring Method
0 cites
US11764113utility2023
Method of 3D Logic Fabrication to Sequentially Decrease Processing Temperature and Maintain Material Thermal Thresholds
0 cites
US11762012utility2023
Wafer Inspection System
0 cites

← PreviousPage 75 of 96Next →