Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US11894240utility2024
Semiconductor Processing Systems with In-situ Electrical Bias
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US11883837utility2024
System and Method for Liquid Dispense and Coverage Control
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US11885003utility2024
Rotational Drive Device, Substrate Processing Apparatus, and Rotational Driving Method
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US11885015utility2024
Deposition Method and Deposition Apparatus
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US11885024utility2024
Gas Introduction Structure and Processing Apparatus
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US11887815utility2024
Plasma Processing System and Method Using Radio Frequency (RF) and Microwave Power
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US11887816utility2024
Plasma Processing Apparatus
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US11887817utility2024
Plasma Processing Apparatus and Plasma Processing Method
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US11887821utility2024
Edge Ring, Plasma Processing Apparatus, and Manufacturing Method of Edge Ring
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US11887822utility2024
Edge Ring and Etching Apparatus
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US11887824utility2024
Method of Cleaning Plasma Processing Apparatus and Plasma Processing Apparatus
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US11887825utility2024
Control Method and Plasma Processing Apparatus
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US11887861utility2024
Substrate Processing Method and Substrate Processing Apparatus
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US11887869utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US11887871utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US11887897utility2024
High Precision 3D Metal Stacking for a Plurality of 3D Devices
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US11879135utility2024
Method for Determining Undifferentiated State of Pluripotent Stem Cell, Method for Subculturing Pluripotent Stem Cell, and Device for Use in the Methods
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US11879839utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US11880213utility2024
Substrate Liquid Processing Apparatus and Substrate Liquid Processing Method
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US11881379utility2024
Film Deposition Apparatus for Fine Pattern Forming
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