Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US11908663utility2024
Plasma Processing Apparatus
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US11908664utility2024
Plasma Processing Apparatus
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US11908665utility2024
Plasma Processing Apparatus and Measurement Method
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US11908666utility2024
Stage and Plasma Processing Apparatus
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US11908680utility2024
Substrate Processing Method and Substrate Processing Apparatus
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US11908712utility2024
Semiconductor Manufacturing Apparatus, Substrate Transfer Method, and Program
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US11908728utility2024
System for Backside Deposition of a Substrate
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US11899476utility2024
Method and Apparatus for Measuring Gas Flow
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US11898840utility2024
Measuring Device and Method of Obtaining Thickness of Sheath
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US11901360utility2024
Architecture Design and Process for Manufacturing Monolithically Integrated 3D CMOS Logic and Memory
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US11901197utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US11901166utility2024
Magnetron Sputtering Apparatus and Magnetron Sputtering Method
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US11901163utility2024
Plasma Processing System and Edge Ring Replacement Method
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US11901158utility2024
Plasma Processing Method, Plasma Processing Apparatus, and Control Apparatus
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US11894222utility2024
Film Forming Apparatus and Film Forming Method
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US11894218utility2024
Electrostatic Chuck, Support Platform, and Plasma Processing Apparatus
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US11894378utility2024
Multiple Nano Layer Transistor Layers with Different Transistor Architectures for Improved Circuit Layout and Performance
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US11894256utility2024
Substrate Holding Mechanism, Substrate Mounting Method, and Substrate Detaching Method
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US11894249utility2024
Control Device, Processing Apparatus, and Control Method
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US11894246utility2024
Bonding Apparatus and Bonding Method
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