Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12586501utility2026
Display Device, Display Method, and Storage Medium
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US12588459utility2026
Gate Valve Apparatus and Semiconductor Manufacturing Apparatus
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US12588461utility2026
Substrate Processing Method and Substrate Processing Apparatus
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US12577665utility2026
Next Generation Bonding Layer for 3D Heterogeneous Integration
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US12578650utility2026
Substrate Processing Apparatus and Substrate Processing Method
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US12580153utility2026
Balanced Resonator Source for Plasma Processing
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US12580154utility2026
Etching Method and Plasma Processing Apparatus
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US12580160utility2026
Etching Method and Etching Apparatus
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US12582017utility2026
Bonding Layer and Process
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US12581898utility2026
Device and Method for Determining Wafer Bow
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US12581883utility2026
Etching Method and Plasma Etching Apparatus
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US12581921utility2026
Multiple Patterning with Selective Mandrel Formation
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US12571096utility2026
Raw Material Gas Supply System and Raw Material Gas Supply Method
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US12571098utility2026
Apparatus and Method for Performing Film Forming Process on Substrates in Substrate Processing Chambers
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US12571102utility2026
Ignition Control Method, Film Forming Method, and Film Forming Apparatus
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US12571104utility2026
Source Gas Supply Method, Source Gas Supply Mechanism, and Film Forming System
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US12571120utility2026
Plating Apparatus
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US12571125utility2026
Method for Forming Polycrystalline Silicon Film
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US12572077utility2026
Heat Treatment Apparatus and Heat Treatment Method
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US12573599utility2026
Plasma Processing Device and Plasma Processing Method
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