Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12100591utility2024
Photoactive Metal-based Hard Mask Integration
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US12100599utility2024
Wet Etch Process and Method to Provide Uniform Etching of Material Formed Within Features Having Different Critical Dimension (CD)
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US12100598utility2024
Methods for Planarizing a Substrate Using a Combined Wet Etch and Chemical Mechanical Polishing (CMP) Process
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US12100616utility2024
Method of Manufacturing Semiconductor Device
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US12100578utility2024
Substrate Processing Method
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US12094753utility2024
Stage Device and Substrate Processing Apparatus
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US12094746utility2024
Semiconductor Manufacturing Apparatus and Method of Controlling Rotation of Stage
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US12094737utility2024
Substrate Processing Apparatus, Control Method, and Computer-readable Storage Medium
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US12094700utility2024
Film Forming Method, Film Forming Apparatus, and Program
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US12094697utility2024
Plasma Processing Apparatus
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US12094696utility2024
Focus Ring Replacement Method and Plasma Processing System
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US12094694utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US12094690utility2024
Plasma Processing Apparatus
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US12091753utility2024
Substrate Processing Apparatus
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US12090529utility2024
Method of Cleaning Stage in Plasma Processing Apparatus, and the Plasma Processing Apparatus
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US12087553utility2024
Gas Supply Ring and Substrate Processing Apparatus
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US12087559utility2024
Plasma Processing Apparatus, Temperature Control Method, and Temperature Control Program
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US12087562utility2024
Substrate Processing Apparatus, Substrate Processing System, and Abnormality Detection Method
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US12087588utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US12087591utility2024
Plasma Processing Apparatus and System
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