Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12276455utility2025
Substrate Processing Apparatus and Substrate Processing Method
0 cites
US12276033utility2025
Methods for Wet Etching of Noble Metals
0 cites
US12272692utility2025
3D Selective Material Transformation to Integrate 2D Material Elements
0 cites
US12272601utility2025
Epitaxial High-k Etch Stop Layer for Backside Reveal Integration
0 cites
US12272590utility2025
Substrate Processing Apparatus
0 cites
US12272559utility2025
Oblique Deposition and Etch Processes
0 cites
US12272558utility2025
Selective and Isotropic Etch of Silicon Over Silicon-germanium Alloys and Dielectrics; via New Chemistry and Surface Modification
0 cites
US12272541utility2025
Etching Method and Etching Apparatus
0 cites
US12272528utility2025
Stage and Plasma Processing Apparatus
0 cites
US12272526utility2025
Substrate Processing Method and Substrate Processing Apparatus
0 cites
US12272520utility2025
Process Control Enabled VDC Sensor for Plasma Process
0 cites
US12269052utility2025
Substrate Liquid Processing Apparatus and Liquid Discharge Evaluation Method
0 cites
US12266562utility2025
Substrate Processing Method and Substrate Processing Apparatus
0 cites
US12264947utility2025
Measuring System, Measuring Device, and Measuring Method
0 cites
US12264396utility2025
Substrate Processing Method
0 cites
US12266534utility2025
Forming a Semiconductor Device Using a Protective Layer
0 cites
US12266533utility2025
Sacrificial Capping Layer for Contact Etch
0 cites
US12266514utility2025
Substrate Processing Apparatus and Substrate Temperature Correction Method
0 cites
US12266511utility2025
Substrate Support and Substrate Processing Apparatus
0 cites
US12265326utility2025
Method for Reducing Lithography Defects and Pattern Transfer
0 cites

← PreviousPage 35 of 96Next →