Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12300525utility2025
Controlling Method and Substrate Transport Module
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US12300524utility2025
Substrate Processing System
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US12300518utility2025
Substrate Processing Apparatus and Substrate Processing Method Having Enhanced Configuration of Replenishing Processing Liquid
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US12300510utility2025
Method for Manufacturing Semiconductor Device
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US12300495utility2025
Processing Apparatus and Processing Method
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US12300477utility2025
Autonomous Operation of Plasma Processing Tool
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US12300475utility2025
Substrate Support and Substrate Processing Apparatus
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US12300469utility2025
Plasma Processing Apparatus, Calculation Method, and Calculation Program
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US12300468utility2025
Method of Uniformity Control
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US12300467utility2025
Plasma Processing Method and Plasma Processing Apparatus
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US12300466utility2025
Plasma Enhanced Film Formation Method
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US12300465utility2025
Plasma Processing Apparatus
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US12300500utility2025
Etching of Polycrystalline Semiconductors
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US12298668utility2025
Heat Treatment Apparatus and Heat Treatment Method
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US12293937utility2025
Plasma Processing Apparatus and Mounting Table Thereof
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US12293903utility2025
Substrate Support and Plasma Processing Apparatus
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US12290898utility2025
Substrate Processing Method and Substrate Processing Apparatus
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US12290835utility2025
Methods for Stabilization of Self-assembled Monolayers (sams) Using Sequentially Pulsed Initiated Chemical Vapor Deposition (spicvd)
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US12289885utility2025
3D Integration of 3D NAND and Vertical Logic Beneath Memory
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US12288671utility2025
Film Deposition Apparatus for Fine Pattern Forming
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