Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12314023utility2025
Treatment Condition Setting Method, Storage Medium, and Substrate Treatment System
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US12315704utility2025
Plasma Processing Apparatus, and Method and Program for Controlling Elevation of Focus Ring
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US12315701utility2025
Film Forming Apparatus
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US12315709utility2025
Method of Performing Maintenance on Substrate Processing Apparatus
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US12312184utility2025
Substrate Transfer Device and Substrate Transfer Method
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US12306029utility2025
Aggregation Method and Processing Apparatus
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US12308208utility2025
Substrate Processing Method and Substrate Processing Apparatus
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US12308294utility2025
Bonding Apparatus and Bonding Method
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US12308250utility2025
Pre-etch Treatment for Metal Etch
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US12308241utility2025
Plasma Processing Method and Plasma Processing Apparatus
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US12308221utility2025
Substrate Processing System and Method for Installing Edge Ring
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US12308212utility2025
In-situ Adsorbate Formation for Plasma Etch Process
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US12306113utility2025
Substrate Inspection Apparatus, Substrate Inspection Method, and Recording Medium
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US12306044utility2025
Optical Emission Spectroscopy for Advanced Process Characterization
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US12297536utility2025
Substrate Processing Apparatus and Substrate Processing Method
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US12297539utility2025
Film Forming System and Film Forming Method
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US12300471utility2025
Stage, Plasma Processing Apparatus, and Cleaning Method
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US12302606utility2025
Semiconductor Devices with Crystallized Channel Regions and Methods of Manufacturing Thereof
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US12300530utility2025
Placement Stage and Substrate Processing Apparatus
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US12300526utility2025
Substrate Processing Control Method, Substrate Processing Apparatus and Storage Medium
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