Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12387948utility2025
System for Processing Substrate and Maintenance Method Thereof
0 cites
US12387954utility2025
Teaching Method for Transfer Device, and Transfer System
0 cites
US12387926utility2025
Selective Film Formation Using Self-assembled Monolayer
0 cites
US12387941utility2025
Etching Method and Plasma Processing Apparatus
0 cites
US12387939utility2025
Substrate Processing Method
0 cites
US12387936utility2025
Plasma Processing Method and Plasma Processing System
0 cites
US12387922utility2025
Film Forming Apparatus, Processing Condition Determination Method, and Film Forming Method
0 cites
US12387919utility2025
ALD Process with Plasma Treatment
0 cites
US12387917utility2025
Plasma Processing Apparatus and Plasma Processing Method
0 cites
US12387914utility2025
Upper Electrode Assembly
0 cites
US12387910utility2025
Plasma Processing with Broadband RF Waveforms
0 cites
US12387908utility2025
Plasma Treatment Apparatus
0 cites
US12387907utility2025
Plasma Processing Apparatus and Substrate Processing Method
0 cites
US12385136utility2025
Apparatus for Performing Film Forming Process on Substrate, and Method of Exhausting Processing Gas from Apparatus for Performing Film Forming Process on Substrate
0 cites
US12385132utility2025
Substrate Processing Apparatus and Substrate Processing Method
0 cites
US12385127utility2025
Film Forming Apparatus and Film Forming Method
0 cites
US12383936utility2025
Cleaning Method and Processing Apparatus
0 cites
US12377497utility2025
Substrate Processing Apparatus and Substrate Processing Method
0 cites
US12377384utility2025
Substrate Processing Apparatus and Control Method of Substrate Processing Apparatus
0 cites
US12378670utility2025
Substrate Processing Method
0 cites

← PreviousPage 24 of 96Next →