Patents/Assignees

Lam Research Corporation

562 patents in portfolio

US12387915utility2025
Lower Plasma Exclusion Zone Ring for Bevel Etcher
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US12387916utility2025
Magnetic Field Control System
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US12387964utility2025
Matched Tcr Joule Heater Designs for Electrostatic Chucks
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US12387965utility2025
Electrostatic Chuck for Use in Semiconductor Processing
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US12379720utility2025
Common Terminal Heater for Ceramic Pedestals Used in Semiconductor for Fabrication
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US12381065utility2025
Methods and Apparatus for Controlling Plasma in a Plasma Processing System
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US12381105utility2025
Coolant Channel with Internal Fins for Substrate Processing Pedestals
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US12371781utility2025
In Situ Protective Coating of Chamber Components for Semiconductor Processing
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US12372872utility2025
Extreme Ultraviolet (EUV) Lithography Using an Intervening Layer or a Multi-layer Stack with Varying Mean Free Paths for Secondary Electron Generation
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US12368075utility2025
Graphene Integration
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US12368029utility2025
Lamellar Ceramic Structure
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US12368057utility2025
Enhanced Closed Loop Gas Based Heat Exchange
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US12368025utility2025
Edge Seal for Lower Electrode Assembly
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US12360510utility2025
Large Spot Spectral Sensing to Control Spatial Setpoints
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US12362153utility2025
Pedestal Setup Using Camera Wafer
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US12362159utility2025
Systems and Methods for Controlling a Plasma Sheath Characteristic
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US12362188utility2025
Method for Preventing Line Bending During Metal Fill Process
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US12362206utility2025
Foreline Assembly for Quad Station Process Module
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US12359311utility2025
Conformal Deposition of Silicon Carbide Films Using Heterogeneous Precursor Interaction
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US12354840utility2025
Systems and Methods for Optimizing Power Delivery to an Electrode of a Plasma Chamber
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