- US12500068utility2025Edge Rings Providing Kinematic Coupling and Corresponding Substrate Processing Systems0 cites
- US12500069utility2025Method of Mounting Wires to Substrate Support Ceramic0 cites
- US12500114utility2025Wafer Lift Pin Mechanism for Preventing Local Backside Deposition0 cites
- US12494345utility2025Pulsing RF Coils of a Plasma Chamber in Reverse Synchronization0 cites
- USD1105018design2025Shower Head0 cites
- US12492469utility2025Sublimation Control Using Downstream Pressure Sensing0 cites
- US12485554utility2025Wafer Handling Robot with Gravitational Field Sensor0 cites
- US12486574utility2025Thermally Controlled Chandelier Showerhead0 cites
- US12489006utility2025Auto-calibration to a Station of a Process Module That Spins a Wafer0 cites
- US12490370utility2025Matchless Plasma Source for Semiconductor Wafer Fabrication0 cites
- US12488992utility2025High Aspect Ratio Dielectric Etch with Chlorine0 cites
- US12482634utility2025Symmetric Coupling of Coil to Direct-drive Radiofrequency Power Supplies0 cites
- US12482636utility2025Process Module Chamber Providing Symmetric RF Return Path0 cites
- US12484139utility2025Matchless Plasma Source for Semiconductor Wafer Fabrication0 cites
- US12480208utility2025Dynamic Sheath Control with Edge Ring Lift0 cites
- US12479004utility2025Selective Attachment to Enhance Sio 2 :sin X Etch Selectivity0 cites
- US12480210utility2025Reduced Diameter Carrier Ring Hardware for Substrate Processing Systems0 cites
- US12473633utility2025Plasma Enhanced Atomic Layer Deposition of Silicon-containing Films0 cites
- US12473638utility2025Liquid Precursor Vaporizer0 cites