Patents/Assignees

ASML Netherlands B.V.

728 patents in portfolio

US12249480utility2025
Fluid Transfer System in a Charged Particle System
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US12248255utility2025
Differential Measurement System
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US12247883utility2025
Wavelength Tracking System, Method to Calibrate a Wavelength Tracking System, Lithographic Apparatus, Method to Determine an Absolute Position of a Movable Object, and Interferometer System
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US12245350utility2025
Optical Isolation Module
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US12242203utility2025
Target for Measuring a Parameter of a Lithographic Process
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US12243768utility2025
Substrate Holder for Use in a Lithographic Apparatus and a Device Manufacturing Method
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US12243714utility2025
Lens Designs
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US12243709utility2025
Apparatus Using Multiple Charged Particle Beams
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US12242206utility2025
Method for Preparing a Substrate and Lithographic Apparatus
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US12242201utility2025
Determining Hot Spot Ranking Based on Wafer Measurement
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US12242200utility2025
Lithography Apparatus and a Method of Manufacturing a Device
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US12242204utility2025
Substrate Support, Lithographic Apparatus, Method for Manipulating Charge Distribution and Method for Preparing a Substrate
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US12238848utility2025
EUV Light Source Target Metrology
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US12237639utility2025
Hollow-core Photonic Crystal Fiber Based Broadband Radiation Generator
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US12237143utility2025
Apparatus of Plural Charged-particle Beams
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US12237144utility2025
Apparatus Using Multiple Beams of Charged Particles
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US12235592utility2025
Object Holder, Electrostatic Sheet and Method for Making an Electrostatic Sheet
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US12235585utility2025
Radiation Conduit
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US12235096utility2025
Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method
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US12232244utility2025
Target Supply Control Apparatus and Method in an Extreme Ultraviolet Light Source
0 cites

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