- US12125714utility2024Methods for Forming Trench Structures in Substrates0 cites
- US12127441utility2024OLED Panel with Advanced Sub-pixel Overhangs0 cites
- US12125699utility2024Selective Carbon Deposition on Top and Bottom Surfaces of Semiconductor Substrates0 cites
- US12125728utility2024Substrate Carrier0 cites
- US12125698utility2024Integrated Epitaxy and Preclean System0 cites
- US12125689utility2024Methods and Apparatus for Toroidal Plasma Generation0 cites
- US12125683utility2024Method to Improve Wafer Edge Uniformity0 cites
- US12125680utility2024Ion Extraction Assembly Having Variable Electrode Thickness for Beam Uniformity Control0 cites
- US12125675utility2024RF Pulsing Assisted Low-k Film Deposition with High Mechanical Strength0 cites
- US12125673utility2024Pulsed Voltage Source for Plasma Processing Applications0 cites
- US12125688utility2024L-motion Slit Door for Substrate Processing Chamber0 cites
- US12123708utility2024Enhanced Cross Sectional Features Measurement Methodology0 cites
- US12123090utility2024Differential Capacitive Sensor for In-situ Film Thickness and Dielectric Constant Measurement0 cites
- US12121925utility2024Edge Blackening for Optical Devices0 cites
- US12115683utility2024Calibration of an Electronics Processing System0 cites
- US12120938utility2024Methods of Fabricating OLED Panel with Inorganic Pixel Encapsulating Barrier0 cites
- US12120925utility2024Descending Etching Resistance in Advanced Substrate Patterning0 cites
- US12119223utility2024Single Precursor Low-k Film Deposition and UV Cure for Advanced Technology Node0 cites
- US12119221utility2024PEALD Nitride Films0 cites
- US12119209utility2024Dynamic Processing Chamber Baffle0 cites