Patents/Assignees

Applied Materials, Inc.

2,863 patents in portfolio

US12136549utility2024
Plasma-enhanced Chemical Vapor Deposition of Carbon Hard-mask
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US12136544utility2024
Etch Uniformity Improvement for Single Turn Internal Coil PVD Chamber
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US12136538utility2024
Deposition Chamber System Diffuser with Increased Power Efficiency
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US12128446utility2024
High Speed Substrate Sorter
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USD1049067design2024
Ring for an Anti-rotation Process Kit for a Substrate Processing Chamber
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US12131952utility2024
Wafer Dicing Using Femtosecond-based Laser and Plasma Etch
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US12131934utility2024
Semiconductor Substrate Support Leveling Apparatus
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US12131948utility2024
Techniques for Void-free Material Depositions
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US12131903utility2024
Pulsed-plasma Deposition of Thin Film Layers
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US12131930utility2024
Inspection System
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US12131913utility2024
Methods, Systems, and Apparatus for Processing Substrates Using One or More Amorphous Carbon Hardmask Layers
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US12131900utility2024
Methods for Depositing Blocking Layers on Metal Surfaces
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US12131269utility2024
Time-series Fault Detection, Fault Classification, and Transition Analysis Using a K-nearest-neighbor and Logistic Regression Approach
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US12131105utility2024
Virtual Measurement of Conditions Proximate to a Substrate with Physics-informed Compressed Sensing
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US12130606utility2024
Disturbance Compensation for Substrate Processing Recipes
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US12130561utility2024
Gas Distribution Plate with UV Blocker
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US12130465utility2024
Variable Height Slanted Grating Method
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US12128524utility2024
Membrane for Carrier Head with Segmented Substrate Chuck
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US12128456utility2024
Megasonic Clean with Cavity Property Monitoring
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US12125734utility2024
Vacuum Seal for Electrostatic Chuck
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