Gas Distribution Plate for a Semiconductor Processing Chamber
Claims (1)
The ornamental design for a gas distribution plate for a semiconductor processing chamber, as shown and described.
Full Description
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FIG. 1 is an isometric view of a gas distribution plate for a semiconductor processing chamber showing our new design;
FIG. 2 is a front elevational view of the gas distribution plate for a semiconductor processing chamber of FIG. 1 , the rear elevational view being a mirror image;
FIG. 3 is a side sectional view of the gas distribution plate for a semiconductor processing chamber along lines 3 - 3 of FIG. 2 ;
FIG. 4 is an enlarged sectional view of a portion of the gas distribution plate for a semiconductor processing chamber of FIG. 3 showing details of an edge and an opening formed therethrough typical of all of the openings in the gas distribution plate for a semiconductor processing chamber; and,
FIG. 5 is an enlarged view of a portion of the gas distribution plate of FIG. 2 showing details of openings formed therethrough typical of all of the openings in the gas distribution plate for a semiconductor processing chamber.
Citations
This patent cites (21)
- USD552565
- USD686582
- USD695241
- USD787458
- USD790489
- USD816434
- US10246777
- USD900760
- US20030010452
- US20040060514
- US20050173569
- US20060151115
- US20080216958
- US20100252197
- US20120090691
- US20120234945
- US20180312974
- US20210222299
- USD1472245
- USD177995
- USD196097