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Patents/USD1035598

Gas Distribution Plate for a Semiconductor Processing Chamber

USD1035598No. D 1,035,598designGranted 7/16/2024

Claims (1)

Claim 1 (Independent)

The ornamental design for a gas distribution plate for a semiconductor processing chamber, as shown and described.

Full Description

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FIG. 1 is an isometric view of a gas distribution plate for a semiconductor processing chamber showing our new design;

FIG. 2 is a front elevational view of the gas distribution plate for a semiconductor processing chamber of FIG. 1 , the rear elevational view being a mirror image;

FIG. 3 is a side sectional view of the gas distribution plate for a semiconductor processing chamber along lines 3 - 3 of FIG. 2 ;

FIG. 4 is an enlarged sectional view of a portion of the gas distribution plate for a semiconductor processing chamber of FIG. 3 showing details of an edge and an opening formed therethrough typical of all of the openings in the gas distribution plate for a semiconductor processing chamber; and,

FIG. 5 is an enlarged view of a portion of the gas distribution plate of FIG. 2 showing details of openings formed therethrough typical of all of the openings in the gas distribution plate for a semiconductor processing chamber.

Citations

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