3 Patents
- US125816902026Method of Forming Semiconductor Device with Implanted Nanosheets
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123826912025Effective Work Function Tuning via Silicide Induced Interface Dipole Modulation for Metal Gates
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US119905222024Effective Work Function Tuning via Silicide Induced Interface Dipole Modulation for Metal Gates
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites