6 Patents
- US125884772026Method of Etching a Semiconductor Device by Etching Initial Mask Structures at a Region Having an Extension Direction Different from the Extension Direction of the Initial Mask Structures
Semiconductor Manufacturing International (Beijing) Corporation
0 cites - US125385462026Semiconductor Structure and Forming Method Thereof
Semiconductor Manufacturing International (Shanghai) Corporation
0 cites - US125307972026Personalized Scene Image Processing Method, Apparatus and Storage Medium
TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
0 cites - US124630492025Semiconductor Structure and Forming Method Thereof
Semiconductor Manufacturing International (Beijing) Corporation
0 cites - US118809992024Personalized Scene Image Processing Method, Apparatus and Storage Medium
TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
0 cites - US116768652023Semiconductor Structure and Fabrication Method Thereof
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
0 cites