Patents/Inventors

Zheng John Ye

Santa Clara, CAUS8 patents

9 Patents

US123946062025
Impedance Control of Local Areas of a Substrate During Plasma Deposition Thereon in a Large PECVD Chamber
Applied Materials, Inc.
0 cites
US121911152025
Dual RF for Controllable Film Deposition
Applied Materials, Inc.
0 cites
US120805162024
High Density Plasma Enhanced Process Chamber
APPLIED MATERIALS, Inc.
0 cites
US119568832024
Methods and Apparatus for Controlling RF Parameters at Multiple Frequencies
APPLIED MATERIALS, Inc.
0 cites
US119357242024
Symmetric VHF Source for a Plasma Reactor
Applied Materials, Inc.
0 cites
US117768352023
Power Supply Signal Conditioning for an Electrostatic Chuck
Applied Materials, Inc.
0 cites
US115877662023
Symmetric VHF Source for a Plasma Reactor
Applied Materials, Inc.
0 cites
US115690722023
RF Grounding Configuration for Pedestals
APPLIED MATERIALS, Inc.
0 cites
US115708792023
Methods and Apparatus for Controlling RF Parameters at Multiple Frequencies
APPLIED MATERIALS, Inc.
0 cites