Patents/Inventors

Zhaozhao Zhu

Milpitas, CAUS22 patents

23 Patents

US124890222025
In-situ Etch Rate and Etch Rate Uniformity Detection System
Applied Materials, Inc.
0 cites
US124671362025
Process Characterization and Correction Using Optical Wall Process Sensor (OWPS)
Applied Materials, Inc.
0 cites
US124696862025
Process Characterization and Correction Using Optical Wall Process Sensor (OWPS)
Applied Materials, Inc.
0 cites
US124493792025
Machine Learning Model Training
Applied Materials, Inc.
0 cites
US124427652025
Transmission Corrected Plasma Emission Using In-situ Optical Reflectometry
Applied Materials, Inc.
0 cites
US124051642025
Spatial Optical Emission Spectroscopy for Etch Uniformity
Applied Materials, Inc.
0 cites
US123396452025
Estimation of Chamber Component Conditions Using Substrate Measurements
Applied Materials, Inc.
0 cites
US122835032025
Substrate Measurement Subsystem
Applied Materials, Inc.
0 cites
US122164552025
Chamber Component Condition Estimation Using Substrate Measurements
Applied Materials, Inc.
0 cites
US121911762025
Integrated Substrate Measurement System to Improve Manufacturing Process Performance
Applied Materials, Inc.
0 cites
US121486472024
Integrated Substrate Measurement System
Applied Materials, Inc.
0 cites
US121365572024
Integrated Substrate Measurement System to Improve Manufacturing Process Performance
Applied Materials, Inc.
0 cites
USD10459232024
Portion of a Display Panel with a Graphical User Interface
Applied Materials, Inc.
0 cites
USD10459242024
Portion of a Display Panel with a Graphical User Interface
Applied Materials, Inc.
0 cites
US120319102024
Transmission Corrected Plasma Emission Using In-situ Optical Reflectometry
Applied Materials, Inc.
0 cites
USD10317432024
Portion of a Display Panel with a Graphical User Interface
Applied Materials, Inc.
0 cites
US120091912024
Thin Film, In-situ Measurement Through Transparent Crystal and Transparent Substrate Within Processing Chamber Wall
Applied Materials, Inc.
0 cites
US119275432024
Multiple Reflectometry for Measuring Etch Parameters
Applied Materials, Inc.
0 cites
US118307792023
In-situ Etch Material Selectivity Detection System
APPLIED MATERIALS, Inc.
0 cites
US116886162023
Integrated Substrate Measurement System to Improve Manufacturing Process Performance
Applied Materials, Inc.
0 cites
US116686022023
Spatial Optical Emission Spectroscopy for Etch Uniformity
Applied Materials, Inc.
0 cites
US116195942023
Multiple Reflectometry for Measuring Etch Parameters
Applied Materials, Inc.
0 cites
USD09775042023
Portion of a Display Panel with a Graphical User Interface
Applied Materials, Inc.
0 cites