25 Patents
- US125786352026Pellicle for an EUV Lithography Mask and a Method of Manufacturing Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124297602025Method for Forming Structure of Pellicle-mask Structure with Vent Structure
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122986622025Mask for EUV Lithography and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US122665252025Photomask Pellicle Including Network of Nanowires and Method of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - US122537962025Extreme Ultraviolet Mask and Method for Forming the Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - 0 cites
- US122226392025Extreme Ultraviolet Mask and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US122102802025EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121745272024Pellicle for an EUV Lithography Mask and a Method of Manufacturing Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121177252024Pellicle for an EUV Lithography Mask and a Method of Manufacturing Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120667552024Pellicle for an EUV Lithography Mask and a Method of Manufacturing Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120558552024Extreme Ultraviolet Lithography Method Using Robust, High Transmission Pellicle
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US120076852024Method for Forming Structure of Pellicle-mask Structure with Vent Structure
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119231962024Photomask Pellicle and Method of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - US119142862024Pellicle Assembly and Method for Advanced Lithography
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd
0 cites - US118861092024EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US118468802023Extreme Ultraviolet Mask and Method for Forming the Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US117893552023Extreme Ultraviolet Mask and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US117823392023Pellicle for an EUV Lithography Mask and a Method of Manufacturing Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US117405492023Extreme Ultraviolet Lithography Method, Extreme Ultraviolet Mask and Formation Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US116626612023EUV Pellicle with Structured Ventilation Frame
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116565442023Robust, High Transmission Pellicle for Extreme Ultraviolet Lithography Systems
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites