53 Patents
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- US125801552026Learning Based Tuning in a Radio Frequency Plasma Processing Chamber
Applied Materials, Inc.
0 cites - US125744862026Stereoscopic Display Device and Control Method Thereof
Beijing BOE Technology Development Co., Ltd.
0 cites - US125735882026Plasma Processing System Configured to Deliver a Pulsed Voltage Waveform
Applied Materials, Inc.
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- US125675392026Methods for Forming a High Current Inductor and Non-transitory Computer Readable Medium
APPLIED MATERIALS, Inc.
0 cites - US125551072026Method and System for Private Decentralized Forward-secure Confidential Transactions
JPMORGAN CHASE BANK, N.A.
0 cites - US125059822025Method and Apparatus for Digital Control of Ion Energy Distribution in a Plasma
Applied Materials, Inc.
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- US124696802025Radio-frequency (RF) Matching Network for Fast Impedance Tuning
Applied Materials, Inc.
0 cites - US124566072025Auxiliary Plasma Source for Robust Ignition and Restrikes in a Plasma Chamber
Applied Materials, Inc.
0 cites - US124134182025Method and System for Secure Aggregation Protocol for Protecting Privacy of Individual Data Sets
JPMORGAN CHASE BANK, N.A.
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- US123689492025Photographing Method and Apparatus, Electronic Device and Readable Storage Medium
VIVO MOBILE COMMUNICATION CO., Ltd.
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- US123560272025Optimal Format Selection for Video Players Based on Predicted Visual Quality Using Machine Learning
Google LLC
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- US123343042025System and Methods for Implementing a Micro Pulsing Scheme Using Dual Independent Pulsers
Applied Materials, Inc.
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- US122938972025Radio Frequency Diverter Assembly Enabling On-demand Different Spatial
Applied Materials, Inc.
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- US122725242025Wideband Variable Impedance Load for High Volume Manufacturing Qualification and On-site Diagnostics
Applied Materials, Inc.
0 cites - US122665062025Scanning Impedance Measurement in a Radio Frequency Plasma Processing Chamber
Applied Materials, Inc.
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- US122371482025Plasma Processing Assembly Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
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- US122057972025Solid-state Switch Based High-speed Pulser with Plasma IEDF Modification Capability Through Multilevel Output Functionality
Applied Materials, Inc.
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- US121069382024Distortion Current Mitigation in a Radio Frequency Plasma Processing Chamber
APPLIED MATERIALS, Inc.
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- US120805192024Smart Dynamic Load Simulator for RF Power Delivery Control System
Applied Materials, Inc.
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- US120209012024RF Impedance Matching Networks for Substrate Processing Platform
APPLIED MATERIALS, Inc.
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- US118481762023Plasma Processing Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
0 cites - US118238682023Hardware Switch on Main Feed Line in a Radio Frequency Plasma Processing Chamber
Applied Materials, Inc.
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- US117767892023Plasma Processing Assembly Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
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- US116343322023Selenium-doped Mxene Composite Nano-material, and Preparation Method and Use Thereof
WUYI UNIVERSITY
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