6 Patents
- US124630162025Devices and Methods for Controlling Wafer Uniformity in Plasma-based Process
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US124127342025Baffle Plate for Controlling Wafer Uniformity and Methods for Making the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US120543822024Roughness Selectivity for MEMS Movement Stiction Reduction
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US117696522023Devices and Methods for Controlling Wafer Uniformity in Plasma-based Process
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US116551382023Roughness Selectivity for MEMS Movement Stiction Reduction
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US116159462023Baffle Plate for Controlling Wafer Uniformity and Methods for Making the Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites